This project has construct and test dual-magnetron sputtering thin film deposited source. For use to study electrical properties and spectrums of plasma by use aluminium and copper targets. The experimental result found that dual-manetron sputtering film deposited source can coat multilayer films of aluminium and copper. The relation between voltage and current of dual-magnetron sputtering thin film deposited source to cause can separate plasma to 3 periods which they are dark mode, plasma mode and sputtering mode. Spectrum measurement can check the spectrum of argon gas, aluminium atom and copper atom. In addition, multilayer film can measure film voltage when increase temperature.